NY Creates Begins Installation of First Major Tool for High NA EUV Lithography Center at Albany Nanotech ComplexMay 7, 2026
Nanoelectronics Safer, Cheaper Method for Creating Futuristic MXenesApril 2, 2026 MXenes, a promising class of 2D materials with diverse applications, have faced manufacturing challenges due to expensive, complex, and wasteful…
Metamaterials New technique could speed up the development of acoustic lenses, impact-resistant films and other futuristic materialsSeptember 18, 2025 This optical micrograph shows an array of microscopic metamaterial samples on a reflective substrate. Laser pulses have been digitally added,…
